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R&D and Production Contact Mask Aligner The Quintel Q4000 MA (Mask Aligner) is a top and bottom side contact lithography printer with the video-view split field microscope used for fine line lithography down to 1 micron or better. It is capable of processing both 4- and 6-inch substrates. After reading this manual, the user should be able to describe a typical MA (quintel) process for both top and backside alignment; explain the theory of operation; and state all hazards associated with the system. After successfully completing the qualification procedures for this tool (see Appendix), the user should be able to perform a full photolithography process for both TSA and BSA using this system. Only trained and approved (qualified) Users may use this tool. Manual X, Y and theta alignment stage Vacuum / Pressure Contact Exposure Modes Splitfield / Singlefield optical microscope • Infrared (IR) back side alignment System description and user manual can see the following link http://microlab.berkeley.edu/labmanual/chap4/4.15.html (this posting is the responsibility of the poster) |
chester-diaz@dfwind.com (Chester Diaz) for more information. All emails will be forwarded to the poster's actual email address.
